1. Product Name: High-Purity Quartz Furnace Tube

2. Material Specifications
Primary Material: Fused quartz (SiO₂ ≥ 99.9%)
Density: 2.2 g/cm³
Thermal Stability: Resists thermal shock up to 1200°C (continuous use).

3. Dimensions
Parameter : Value / Tolerance
Outer Diameter : 415 mm / ±1.5 mm
Inner Diameter : 405 mm / ±1.0 mm
Wall Thickness : 5 mm / ±0.5 mm
Length : 2300 mm / ±5 mm

4. Technical Parameters
Max Working Temperature: 1200°C (short-term peak: 1450°C).
Pressure Resistance: Withstands 1 atm (vacuum or low-pressure environments).
Thermal Expansion Coefficient: 0.55 × 10⁻⁶ /°C (20–1000°C).
Surface Finish: Smooth, non-porous, acid-washed.

5. Key Features
① Ultra-high purity for contamination-sensitive processes.
② Excellent chemical resistance to acids, halogens, and most corrosive gases.
③ Low thermal expansion ensures dimensional stability.

6. Applications
Semiconductor wafer processing.
High-temperature annealing, CVD, or diffusion furnaces.
Laboratory research and optical industries.

7. Handling & Storage
Packaging: Foam-padded wooden crate.
Storage: Keep dry, avoid direct sunlight, and store horizontally.

8. Notes
Avoid mechanical impact or rapid temperature changes (>200°C/min).
Custom modifications (e.g., flanges, coatings) available upon request.

For detailed technical support or bulk orders, please consult our engineering team.
Email：luzhenzhu@tuguanshiying.com